GE3023 FUNDAMENTALS OF NANOSCIENCE SYLLABUS | ANNA UNIVERSITY B.TECH. FOOD TECHNOLOGY 5TH SEMESTER SYLLABUS REGULATION 2008 2011 2012-2013 BELOW IS THE ANNA UNIVERSITY FIFTH SEMESTER B.TECH. FOOD TECHNOLOGY DEPARTMENT SYLLABUS, TEXTBOOKS, REFERENCE BOOKS, IT IS APPLICABLE FOR ALL STUDENTS ADMITTED IN THE YEAR 2011 2012-2013 (ANNA UNIVERSITY CHENNAI,TRICHY,MADURAI,TIRUNELVELI,COIMBATORE), 2008 REGULATION OF ANNA UNIVERSITY CHENNAI AND STUDENTS ADMITTED IN ANNA UNIVERSITY CHENNAI DURING 2009
GE3023 FUNDAMENTALS OF NANOSCIENCE L T P C
3 0 0 3
AIM
To make the students understand the importance , relevance and potentialities of this
emerging field of study.
OBJECTIVES
Study the basic nano technology and nano science.
Understand interdisciplinary nature of this field.
Understand the importance role of physics, chemistry, biology.
Recognize that the rules of nano science are fundamentally different than those we
experience.
Study the basic fabrication strategies of nano science.
UNIT I INTRODUCTION 10
Nanoscale Science and Technology- Implications for Physics, Chemistry, Biology and
Engineering-Classifications of nanostructured materials- nano particles- quantum dots,
nanowires-ultra-thinfilms-multilayered materials. Length Scales involved and effect on
properties: Mechanical, Electronic, Optical, Magnetic and Thermal properties. Introduction to
properties and motivation for study (qualitative only).
UNIT II PREPARATION METHODS 10
Bottom-up Synthesis-Top-down Approach: Precipitation, Mechanical Milling, Colloidal
routes, Self-assembly, Vapour phase deposition, MOCVD, Sputtering, Evaporation,
Molecular Beam Epitaxy, Atomic Layer Epitaxy, MOMBE.
UNIT III PATTERNING AND LITHOGRAPHY FOR NANOSCALE DEVICES 5
Introduction to optical/UV electron beam and X-ray Lithography systems and processes, Wet
etching, dry (Plasma /reactive ion) etching, Etch resists-dip pen lithography
UNIT IV PREPARATION ENVIRONMENTS 10
Clean rooms: specifications and design, air and water purity, requirements for particular
processes, Vibration free environments: Services and facilities required. Working practices,
sample cleaning, Chemical purification, chemical and biological contamination, Safety
issues, flammable and toxic hazards, biohazards.
UNIT V CHARECTERISATION TECHNIQUES 10
X-ray diffraction technique, Scanning Electron Microscopy - environmental techniques,
Transmission Electron Microscopy including high-resolution imaging, Surface Analysis
techniques- AFM, SPM, STM, SNOM, ESCA, SIMS-Nanoindentation
TOTAL : 45 PERIODS
42
TEXT BOOKS
1. A.S. Edelstein and R.C. Cammearata, eds., “Nanomaterials: Synthesis, Properties and
Applications”, Institute of Physics Publishing, Bristol and Philadelphia, 1996.
2. N John Dinardo, “Nanoscale charecterisation of surfaces & Interfaces”, 2nd Edition,
Weinheim Cambridge, Wiley-VCH, 2000
REFERENCES
1. G Timp (Editor), “Nanotechnology”, AIP press/Springer, 1999
2. Akhlesh Lakhtakia (Editor), “The Hand Book of Nano Technology,Nanometer Structure”,
Theory, Modeling and Simulations”, Prentice-Hall of India (P) Ltd, New Delhi, 2007.
GE3023 FUNDAMENTALS OF NANOSCIENCE L T P C
3 0 0 3
AIM
To make the students understand the importance , relevance and potentialities of this
emerging field of study.
OBJECTIVES
Study the basic nano technology and nano science.
Understand interdisciplinary nature of this field.
Understand the importance role of physics, chemistry, biology.
Recognize that the rules of nano science are fundamentally different than those we
experience.
Study the basic fabrication strategies of nano science.
UNIT I INTRODUCTION 10
Nanoscale Science and Technology- Implications for Physics, Chemistry, Biology and
Engineering-Classifications of nanostructured materials- nano particles- quantum dots,
nanowires-ultra-thinfilms-multilayered materials. Length Scales involved and effect on
properties: Mechanical, Electronic, Optical, Magnetic and Thermal properties. Introduction to
properties and motivation for study (qualitative only).
UNIT II PREPARATION METHODS 10
Bottom-up Synthesis-Top-down Approach: Precipitation, Mechanical Milling, Colloidal
routes, Self-assembly, Vapour phase deposition, MOCVD, Sputtering, Evaporation,
Molecular Beam Epitaxy, Atomic Layer Epitaxy, MOMBE.
UNIT III PATTERNING AND LITHOGRAPHY FOR NANOSCALE DEVICES 5
Introduction to optical/UV electron beam and X-ray Lithography systems and processes, Wet
etching, dry (Plasma /reactive ion) etching, Etch resists-dip pen lithography
UNIT IV PREPARATION ENVIRONMENTS 10
Clean rooms: specifications and design, air and water purity, requirements for particular
processes, Vibration free environments: Services and facilities required. Working practices,
sample cleaning, Chemical purification, chemical and biological contamination, Safety
issues, flammable and toxic hazards, biohazards.
UNIT V CHARECTERISATION TECHNIQUES 10
X-ray diffraction technique, Scanning Electron Microscopy - environmental techniques,
Transmission Electron Microscopy including high-resolution imaging, Surface Analysis
techniques- AFM, SPM, STM, SNOM, ESCA, SIMS-Nanoindentation
TOTAL : 45 PERIODS
42
TEXT BOOKS
1. A.S. Edelstein and R.C. Cammearata, eds., “Nanomaterials: Synthesis, Properties and
Applications”, Institute of Physics Publishing, Bristol and Philadelphia, 1996.
2. N John Dinardo, “Nanoscale charecterisation of surfaces & Interfaces”, 2nd Edition,
Weinheim Cambridge, Wiley-VCH, 2000
REFERENCES
1. G Timp (Editor), “Nanotechnology”, AIP press/Springer, 1999
2. Akhlesh Lakhtakia (Editor), “The Hand Book of Nano Technology,Nanometer Structure”,
Theory, Modeling and Simulations”, Prentice-Hall of India (P) Ltd, New Delhi, 2007.
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